Elastic scattering cross sections and transport of tin ions in extreme ultraviolet lithography sources

Abstract

Energetic tin ions are created by laser produced plasmas in extreme-ultraviolet lithography sources where hydrogen must be used as a buffer gas to protect critical optical components. In this study, the quantum chemistry code NWChem is used to calculate the interatomic potential between singly ionized tin and molecular hydrogen. The interatomic potential was fit by an inverse-power potential, a modified universal ZBL potential, and a two-piece-Lennard-Jones potential which were in turn used to calculate the classical distance of closest approach, scattering angle, total elastic scattering cross sections. Furthermore, the universal Ziegler-Biersack-Littmark (ZBL) potential was used in the open-source binary collision approximation codes RustBCA as well as Stopping Range in Matter and Transport of Ion in Matter (SRIM/TRIM) to calculate ion ranges, straggling, and stopping cross sections in a hydrogen gas target.