Abstract
Boron-carbon-nitrogen films were grown by RF reactive sputtering from a B4C target and N2 as reactive gas. The films present phase segregation and are mechanically softer than boron carbide films (a factor of more than 2 in Young's modulus). This fact can turn out as an advantage in order to select buffer layers to better anchor boron carbide films on substrates eliminating thermally induced mechanical tensions.
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