Abstract

Boron suboxide BOx thin films have been deposited on Si (100) by reactive rf magnetron sputtering of B powders in an Ar/O2 atmosphere. Elastic recoil detection analysis and x-ray diffraction were used to study the influence of the O incorporation on the film composition and structure and relate them to mechanical properties, which were evaluated by nanoindentation. As x in BOx was increased from 0.08 to 0.18, the elastic modulus of the x-ray amorphous films decreased from 273 to 231 GPa, by 15%. This can be understood using classical molecular dynamics (MD) with a Buckingham-like interaction potential: The increase in the O concentration and corresponding formation of B–O bonds, shown to be longer than the B–B bonds, resulted in larger ionic contributions as well as a density reduction. This increased ionicity was responsible for the observed decrease in elastic modulus. As even more O was incorporated (x>0.18), the H concentration increased, exceeding 0.3 at. %. This may cause the formation of boric acid (H3BO3) as a result of the chemical reaction with H2O upon atmosphere exposure. The presence of van der Waals and hydrogen bonding, associated with H3BO3 formation, provides a reasonable explanation for the extensive decrease in elastic modulus from 231 to 15 GPa, by 94%. The parameterization for the Buckingham-like interaction potential, introduced in this study, can be used for MD simulations of amorphous BOx systems without H3BO3.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.