ELABORATION AND CHARACTERIZATION OF ZNO THIN FILMS STRUCTURAL AND OPTICAL STUDY

Abstract

The Nano-topographical structure of the solid surface is known as a necessary parameter in the physicochemical characterization and wetting properties. In this study, the physicochemical properties are evaluated by calculating the surface energy and by measuring the contact angle. The structural proprieties were determined using XDR. The optical proprieties were studied using the UV-visible technics. Substrates used in this study are the zinc oxide thin films deposited on the glass by sputtering under different powers (150, 200 and 250 watt). The Nano -topographic properties were examined using the atomic force microscopy (AFM) in order to calculate the roughness of different substrates. As results, the images obtained by atomic force microscopy showed that the growth of the power causes the growth of the roughness. XRD diagram assessment revealed that the deposited films have a preferential crystallographic direction according to the (002) plane while maintaining the initial orientation. The optical characterization showed that the bandwidth of these films is in the order of 3.28 eV. It is interesting to mention that the increase in RF power has slightly increased the energy of gap.