Abstract
An eight-level diffractive microlens (DML) array for beam splitting is designed and fabricated by a LIGA-like process. The pattern of this dual-focal-point DML was designed using the optimal rotation-angle method and realized by silicon etching, nickel (Ni) electroplating and hot embossing. Tetraethoxysilane (TEOS) oxide etching and specially designed demold techniques were developed and employed in the fabrication process to minimize the related processing errors such as misalignment and tilting so that the accuracy of DML could be ensured. The obtained poly(methyl methacrylate) (PMMA)-based DML was measured to confirm the optical properties and the results showed that the diffraction efficiency error and uniformity error were successfully kept under 5.19 and 1.52%, respectively.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
