Abstract

Yttrium silicate (Y–Si–O) films with eggshell- and fur-like microstructures were prepared by laser chemical vapor deposition using a Nd:YAG laser, and tetraethyl orthosilicate (TEOS) and yttrium dipivaloylmethane (Y(dpm) 3) precursors. Amorphous Y–Si–O films were prepared at deposition temperature below 1200 K. The crystalline Y–Si–O films with mixtures of Y 4.67(SiO 4) 3O and α-Y 2Si 2O 7 phases were obtained at deposition temperature above 1200 K. y-Y 2Si 2O 7 and X1-Y 2SiO 5 minor phases were also formed at a higher deposition temperature. At deposition temperature ranging between 1285 and 1355 K, a dome-like structure covered with fine fur-like projections was formed under a total pressure of 3.5 kPa, whereas an eggshell-like structure 200–300 μm in diameter and 10–20 μm in shell thickness was formed at 7.5 kPa. The deposition rate for the Y–Si–O films with fur- and eggshell-like microstructures reached 300 and 1000 μm h −1, respectively.

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