Abstract

Both bacteria found on the hair and the ones found in the water used in hair treatment are the constituent of hair-dressing salon effluent. Effluent bacteriological and physico-chemical qualities together with biodegradation potentials of bacteria isolated from hair-dressing salon effluents generated in Benin City were examined. The toxicity of the effluent on test microorganism (Nitrobacter) was also determined. The mean physico-chemical values of hair-dressing salon effluent showed that salon liquid wastes can be characterized as slightly more ?industrial strength? than typical domestic waste-water. The pH values indicated the alkaline nature of the effluent (10.6 ± 0.2). The mean total suspended solid (21.5 ± 3.1mg/l) showed that the effluent contains some sludge. Major bacterial isolates isolated from the effluent include Staphylococcus aureus, Bacillus spp, Streptococcus spp. and Staphylococcus spp. Data obtained showed that even though Staphylococcus aureus and Bacillus spp had highest frequency of isolation (35.5 and 32.8% respectively), Bacillus spp. followed by Staphylococcus spp. demonstrated the highest ability to utilize salon effluent as sole carbon source. The toxicity level (24h LC50) of salon effluent was found to be very low to Nitrobacter (950 ± 50 mg/1). The ultimate biodegradable value of salon effluent (63.9 - 71.6%) indicate that effluent generally contain readily microbial oxidizable organic carbon.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.