Abstract
This paper reports on the techniques employed to control the re-deposition of the partially dissociated organic photoresist (PR) by-products in advanced non-oxidizing strip processes developed to meet the PR removal requirements of future technology nodes. System features, such as the design of heated process chamber walls and an on-board, RF-based oxygen plasma effluent abatement system are described in detail. The performance of these features to prevent or eliminate hydrocarbon buildup and manage effluent with non-oxidizing strip processes is also presented and discussed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
