Abstract
Thin c-Si-based photoelectrochemical cells are regarded as one of the most promising alternatives to ensure cost-effectiveness of water-splitting systems. In this work, we demonstrate a lithium fluoride (LiFX) layer as an electron-selective contact for cost-competitive 30-µm thick c-Si photoanode devices. To ensure low contact resistance through LiFX/Al contacts on c-Si substrates is demonstrated; due to this low-resistance contact, efficient oxygen-evolution reactions might increase. We achieve an onset-voltage reduction with a cathodic shift of approximately 233 mV and an overpotential reduction of approximately 270 mV at 10 mA/cm2 in a 1 M KOH solution. These results offer a cost-effective enhancement of thin c-Si photoelectrodes for water-splitting systems.
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