Abstract
Direct laser writing with high power densities at a wavelength of 244 nm is applied to the patterning of surface relief diffractive optical elements (DOEs) with submicron features in thin chalcogenide layers of different compositions. The topology of created features in dependence on exposure conditions is investigated. Potential and limitations of this technique for the fabrication of efficient DOEs for applications from the visible to the near infrared spectral region are discussed on the basis of examples.
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