Abstract
A manganese oxide (MnOx) diffusion barrier layer was formed by chemical vapor deposition (CVD) on SiO2 substrates with or without preannealing. The thickness dependence of the MnOx layer was investigated in relation to the desorption behavior of water vapor from the substrates. A good correlation was found between MnOx thickness and the amount of desorbed water vapor. It is necessary to control the amount of absorbed water in the substrate to form a thin MnOx barrier layer with good thickness reproducibility.
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