Abstract
While thin film metallic glass (TFMG) materials have been studied widely due to their easy fabrication process and unique properties, the W-based or W-containing TFMGs have yet to be explored extensively. In this work, four W-containing Zr–W–Ti TFMGs were fabricated by a magnetron co-sputtering system. The power of W target was adjusted to obtain TFMGs with different W concentrations. The amorphous phase of TFMG was determined by X-ray diffraction and high resolution transmission electron microscopy. In cross-sectional morphologies, a vein fracture pattern was observed using field-emission scanning electron microscopy. Although the hardness of W-containing Zr–W–Ti TFMG was not very high, the hardness of coating increased with increasing W content to reach 7.6GPa. Good adhesion quality and adequate corrosion resistance were also obtained for each Zr–W–Ti TFMGs.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
