Abstract
Knowledge of the radiative properties of multilayer consisting of silicon and related materials, such as silicon dioxide (SiO2), silicon nitride (Si3N4) and gold (Au) with different thicknesses is required for many microsystem applications. This paper describes the study of the effects of thin film thickness on radiative properties of nano scale multilayer. The results showed that silicon dioxide and silicon nitride coating act as anti reflector and these coatings reduce reflectance toward bare silicon. If thickness of non metal coating increases, reflectance of multilayer decreases and transmittance increases. Gold thin film coating increases reflectance. The reflectance of multilayer coated with gold increases by increasing the thickness of coating. This study will benefit and enhance the value of nano coating technology in the semiconductor industries, particularly in the development of micro electromechanical and nano electromechanical devices.
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