Abstract
Amorphous fluoropolymer (AF) thin films have been prepared from Teflon AF 1600 solution by spin-coating. Scanning electron micrograph (SEM) observations reveal that the film has planar and compact surface without any pinhole, and there are many pores in the matrix. By capacitance–voltage ( C– V) and current–voltage ( I– V) measurements, the dielectric constant of the AF film is equal to 1.57 at 1 MHz, and breakdown strength is 2.07 MV cm −1. The Fourier transform infrared spectroscopy (FTIR) spectra and X-ray diffraction (XRD) patterns of the films show that the films have excellent thermal stability below 400°C, and thermal treatment does not change amorphous nature of the films. X-ray photoelectron spectroscopy (XPS) spectra reveal decomposition of CF 3 groups due to annealing at 400°C, leading to a remarkable increase in CF 2 groups. Possible decomposition mechanisms of AF film are also discussed.
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