Abstract
Abstract TiAlN films with thicknesses of 250, 500 and 750 nm were deposited on 4140 steel using the reactive direct current co-unbalanced magnetron sputtering method. The effects of the film thickness on the microstructure were revealed using a field emission scanning electron microscope, an image analyzer and X-ray diffraction. The results showed that grain size apparently increased when the film was at greater thicknesses whereas porosity, lattice strain and dislocation density decreased. Meanwhile, the results of anodic polarization tests in air-saturated 3.5 wt.-% NaCl solution at pH levels of 2, 7 and 10 and at 25 °C showed lower corrosion potential in thicker film, attributed to a lower ratio of grain boundary area to individual grain area. However, a more stable passive film with higher pitting potential was formed. By analyzing using X-ray absorption spectromicroscopy, oxidation of Ti into TiO2 was found on the corroded surface of TiAlN film.
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