Abstract
Details are given of an experimental study of the effects of surface treatment of silicon substrate on the field emission process of flat amorphous diamond (a-D) film field emitters. Using a filtered cathodic vacuum arc plasma deposition system (FCVAPD), the amorphous diamond (a-D) film was deposited on both non-treated and etched silicon wafers (n-type and p-type). The field electron emission characteristic was measured before and after depositing a-D film. The a-D film on etched silicon wafer shows distinct increase in emission current compared with that on non-treated silicon wafer. The phenomenon is attributed to two important reasons: the low or even negative surface electron affinity of a-D film and the local field enhancement at the Si-diamond interface.
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