Effects of temperature and pressure level on lipid oxidation and physicochemical properties during chafing dish fried process (606.1)

Abstract

Chafing Dish is very important and common condiment for Chinese customers. The effects of different temperatures and pressure levels on Acid value, TBARS and physicochemical properties of the chafing dish products were investigated during fried process. The chemical parameters, such as Acid Value, TBARS, NaNO3 and NaNO2, slightly increased as temperature, but Aw decreased from 0.45 to 0.38 when temperature was increased from 80 °C to 160 °C. In addition, L* value (66.05) at 100 °C were highest in all of groups, while the lowest of a* value (18.66) was observed at 160 °C. For the chemical parameters of the chafing dish products, they slightly increased as pressure except for Aw. For 400 MPa, chemical parameters were significantly different (p < 0.05) from other treated samples. Of importance, the lower pressure restrained the increase of NaNO3 and NaNO2 which were harmful for health. At 100 MPa, the treatment increased significantly the L* and a* value. However, the higher pressure (>100Mpa) decreased the L* and a* value of samples. Moreover, compared with temperature and pressure individually, combination of temperature and pressure effectively (p < 0.05) prolong the oxidation induction period of samples. Therefore, the study suggests that the lipid oxidation and physicochemical properties of chafing dish product can be regulated effectively by combination of temperature and pressure.Grant Funding Source: This research was supported by Application and Development Plan of CQ CSTC (No. CSTC2014yykfA0094)