Abstract
The effect of substrate temperature on the structure and properties of magnetron sputtered Zr–Cu–Ni–Al–Hf–Ti thin films were systematically investigated. With increasing deposition temperature from 293K to 493K, the films remain amorphous but their thermal stability decreases. Crystallization occurs as the substrate temperature reaches 563K. It was demonstrated that the hardness and Young's modulus of glassy films were enhanced and fracture toughness was worsen by increasing the substrate temperature, along with generating a denser structure. Through the scaling analysis, it was revealed that all glassy films grow in an anomalous mode. These metallic glass films prepared herein exhibit extremely low roughness, less than 1nm, high thermal stability and excellent mechanical properties, which are useful properties for their potential use for MEMS and other industry applications.
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