Abstract
The effects of substrate temperature and ion irradiation on the formation and the structure of thin Co films during vacuum deposition onto air-cleaved NaCl(100) single crystal surfaces were investigated using transmission electron microscopy (TEM). Both rise in the substrate temperature and the ion irradiation, caused considerable changes in average grain size, structure and orientation of the Co films. In particular, a well pronounced cubic (fcc) phase was established from ion irradiation, whereas the physical vapour deposited room temperature Co films without ion irradiation show a hexagonal (hcp) structure. The effects of ion irradiation during the growth of Co films on NaCl(100) substrate at room temperature were found to be identical to the effects of raising the substrate temperature to the range of 80°C–90°C during the physical vapour deposition.
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