Effects of strong magnetic field on plasma immersion ion implantation of dielectric substrates

Abstract

In this paper the effects of a strong magnetic field on plasma immersion ion implantation (PHI) of dielectric substrates were investigated. A plasma fluid model and finite difference schemes were used to simulate a one-dimensional system of plasma immersion ion implantation. The effect of secondary electron emission from the electrode on PHI was also taken into consideration. It was found that the magnitude and direction of the magnetic field have slight effects on sheath thickness but have considerable effects on current densities in the y and z directions which are perpendicular to the direction of the electric field (the x direction). The simulations showed that the current densities in the y and z directions increased significantly with increasing magnitude of the magnetic field at a given fixed angle, the reason being attributed to the rotational force exerted on the ions by the magnetic field. With a fixed magnetic field, increasing the angle of the magnetic field, θ, with respect to the electric field produced a continuous increase in current density in the y direction from zero to its maximum at θ = 90° but the current density in the z direction could be described as saddle-shaped being zero at both ends.