Abstract
The magnetron sputtering amorphous diamond-like carbon film is successfully deposited by SiNx interlayer approach. The scanning electron microscopy study reveals the creation of high uniform surface micrograph diamond-like carbon films with SiNx interlayer. For comparison, diamond-like carbon films with different interlayers are also grown. The Raman spectra are analyzed in order to characterize the stressed induce peak shifts of the films. The interactions of C atom with Si(100) and SiNx surface are studied by density functional theory simulation. The effects of interlayers on the films deposition and the considering deposition mechanism are discussed. It is suggested that the diamond-like carbon and SiNx bilayer structure can help to render applications in protective coatings and high quality silicon on diamond related radiation tolerance devices.
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