Abstract
Fullerenelike hydrogenated carbon films were produced by pulse bias-assisted rf inductively coupled plasma enhanced chemical vapor deposition (ICPECVD). The effects of pulse duty cycle on the microstructure and mechanical properties of the resultant films were investigated by means of high resolution transmission electron microscopy (HRTEM), Raman spectroscopy, nanoindentation, and stress measurement. The low pulse duty cycle was found the key in the formation of fullerenelike structure in hydrogenated carbon films, and thus increased the hardness, elasticity, and internal stress of the films. The role of pulse duty cycle in evolution of fullerenelike structure was also discussed in terms of ion bombardment, hydrogen removal, and “annealing” effects.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
