Effects of pulse bias duty cycle on fullerenelike nanostructure and mechanical properties of hydrogenated carbon films prepared by plasma enhanced chemical vapor deposition method

Abstract

Fullerenelike hydrogenated carbon films were produced by pulse bias-assisted rf inductively coupled plasma enhanced chemical vapor deposition (ICPECVD). The effects of pulse duty cycle on the microstructure and mechanical properties of the resultant films were investigated by means of high resolution transmission electron microscopy (HRTEM), Raman spectroscopy, nanoindentation, and stress measurement. The low pulse duty cycle was found the key in the formation of fullerenelike structure in hydrogenated carbon films, and thus increased the hardness, elasticity, and internal stress of the films. The role of pulse duty cycle in evolution of fullerenelike structure was also discussed in terms of ion bombardment, hydrogen removal, and “annealing” effects.