Abstract
In this research, titanium dioxide (TiO2) ultra-thin films have been successfully obtained on lamina-glass substrates by thermal oxidation of DC magnetron sputtered titanium. The as-deposited and the annealed films have been characterized by different techniques. The X-ray diffraction (XRD) results revealed the amorphous structure of as-deposited titanium and anatase crystal structure for the annealed films. The atomic force microscopy (AFM) results showed that increasing the annealing temperature could lead to rougher and larger grain size in the films. Finally, the optical data and band-gap calculations of the films were obtained using the transmittance spectrum, indicating that non-stoichiometric structure of the films could directly influence the amounts of the Eg value.
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