Abstract

Room temperature deposition of PVP capped nanostructured NiO/Ni(OH)2 thin film, the morphological and optical characterizations by solution growth technique are reported. The nanostructured thin films which were deposited on optical glass substrates were annealed at different temperatures and then subjected to structural, morphological and optical characterizations. X-ray diffraction measurements of the films revealed that higher temperatures during the thermal treatment enhanced the crystallinity of the thin films. The SEM surface micrographs show non-interconnected uniformly deposited fibre-like structures with approximate lengths between 400 and 1200nm. The optical band gap energy roughly decreased from about 2.7eV to about 2.2eV with thermal treatment. The absorbance of the thin films annealed at 300 and 400°C was as high as 90% in the visible region of the electromagnetic spectrum. These materials could be useful in solar thermal conversion processes.

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