Abstract
Understanding the effects of thin film electroless deposition parameters at nanoscale is crucial for complete understanding and control of the thin film deposition process. In this study, we investigated and optimized the effect of precursor concentration on the nanoscale surface morphology of electroless deposited Pd thin film. The FESEM characterization of plain substrates showed that the dominant features of plain alumina substrates were terraces, steps and bumpy microstructures and the final surface morphologies of the deposited Pd thin film was strongly dependant on the surface morphologies of the substrate. FESEM characterization results of seeding technique displayed a thin film of Pd nanoparticles on the surface of the alumina substrate. The number of times that the seeding process was carried out was optimized at five seeding times using hydrazine as a reducing agent. FESEM characterization revealed that the nanoscale surface morphology of the Pd thin film was strongly dependent on precursor concentration. Three types of secondary nanoscale surface morphologies formed were nanorods, nanoflakes and flower-like Pd nanostructures at various concentrations. The nanoflake surface density was strongly dependent on precursor concentration. Results of this research provided a foundation and method to tailor the nanoscale surface morphology to the specific requirement of surface dependent processes or reactions.
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