Abstract
The dissolution rates (DR) in methyl ethyl ketone (MEK) of thin films of poly(methyl methacrylate), (PMMA), were measured using interferometry. Films were spun on silicon-oxide coated wafers. After baking at 155°C for one hour the dry films were about 1 μm thick. PMMA samples with M n of 6000 to 320 000 were prepared by (a) polymerization and fractionation, and (b) electron beam bombardment of coated wafers. Both preparations resulted in non-linear behaviour when log DR was plotted against log M n. The irradiated samples uniformly had DR values that were about 2.5 × those of the unexposed samples of the same M n. Plasticization of PMMA by poly(ethylene oxide), PEO, of M n = 4000 also changed DR in direct proportion to the amount of PEO added. With a weight fraction of 0.2 PEO, the DR was double that for PMMA alone.
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