Abstract

We report on the effects of 8 MeV Si3+ ion irradiation on the structural, morphological and optical properties of nanostructured SnO2 thin films, prepared by a simple thermal evaporation method. The structural and morphological evolution of nanostructured SnO2 thin films upon MeV ion irradiation was studied by X-ray diffraction (XRD) and atomic force microscopy (AFM), while the optical properties of the thin films were characterized by Raman spectroscopy and photoluminescence spectroscopy (PL). XRD studies revealed the presence of nanocrystals of orthorhombic SnO2 and cubic Sn in the as-deposited thin films. AFM studies revealed growth of SnO2 nanoparticles in the films upon MeV ion irradiation. PL studies on the 8 MeV Si ion irradiated nanostructured SnO2 thin films revealed strong enhancement in the intensity of UV and visible emissions from SnO2 nanostructures.

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