Abstract
During thermal plasma processing of materials, vapor generated from injected particulate matter will enter the plasma. Even traces of metallic vapors may have a strong effect on the properties and the behavior of the plasma and on the associated heat flux to the injected particles. In this paper a model system is considered in which an argon plasma at atmospheric pressure is “contaminated” by small amounts of copper vapor. By using the Chapman-Enskog approximation for a multicomponent gas mixture the transport properties are calculated for such a contaminated argon plasma. The results show that there is a drastic effect on the electrical properties. For temperatures below 104 K, the electrical conductivity, for example, increases by more than an order of magnitude if metallic vapor is present. The presence of metallic contaminants is also somewhat felt by the reactional thermal conductivity. In contrast, there is no effect on the heavy-particle properties as long as the percentage of the contaminants remains small.
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