Abstract
We have achieved in situ magnesium doping into nanocrystalline cubic boron nitride thin films during sputter deposition. It was clarified, through x-ray diffraction, Fourier transform infrared spectroscopy and x-ray photoelectron spectroscopy, that less than 1 at% magnesium doping does not significantly affect the growth of the cubic phase. Magnesium-doped films deposited in pure argon showed electric conductivity up to 104 times higher than the undoped film. Although the Hall voltage was not reproduced reliably for most of the cases, the films containing 2.1 at% magnesium clearly revealed p-type conduction with carrier concentration and mobility of 4 × 1014 cm−3 and 6 cm2 V−1 s−1, respectively, at 380 K. It was also found that the increase in electric conductivity with magnesium concentration was accompanied by the decrease in the relative amount of nitrogen in the film.
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