Effects of irradiation with electrons of different energies on the dark conductivity and the network of hydrogenated amorphous silicon films

Abstract

The effects of irradiation with electrons having energies in the range 0.7–1.7 MeV on the dark conductivity and the network of hydrogenated amorphous silicon (a-Si:H) thin films have been studied. The dark conductivity measurements show that electron irradiation leads to a degradation in the dark conductivity, with the degradation being greater at lower electron energies. The Raman results suggest that the irradiation induces structural defects in the a-Si:H films, with the lower energy electrons producing more disorder in the amorphous network.