Effects of interface steps on the valley-orbit coupling in a Si/SiGe quantum dot

Abstract

Valley-orbit coupling is a key parameter for a silicon quantum dot in determining its suitability for applications in quantum information processing. In this paper we study the effect of interface steps on the magnitude and phase of valley-orbit coupling for an electron in a silicon quantum dot. Within the effective mass approximation, we find that the location of a step on the interface is important in determining both the magnitude and the phase of the valley-orbit coupling in a Si/SiGe quantum dot. Specifically, our numerical results show that the magnitude of valley orbit coupling can be suppressed up to 75\% by a step of one atomic monolayer, and its phase can change by almost $\pi$. When two steps are present, the minimum value of the valley-orbit coupling can even approach zero. We also clarify the effects of an applied external magnetic field and the higher orbital states on the valley-orbit coupling. Overall, our results illustrate how interface roughness affect the valley-orbit coupling in silicon, and how spin qubits in silicon may be affected.