Abstract
Hydrogen atoms accumulate in the grain boundaries, dislocations and twins of metals, but the Fe-based amorphous coatings do not have these crystal defects. The effect of hydrogen on the passivation and semiconductive properties could provide a theoretical support for the application of Fe-based amorphous coatings at high hydrogen concentrations. The passivation and semiconductive properties of passive film on plasma-sprayed Fe-based amorphous coatings were investigated via electrochemical impedance spectroscopy combined with a point defect model. The phase compositions of the passive films were verified via X-ray photoelectron spectroscopy. The morphology of the coatings and the surface state of the passive films were characterized via scanning electron microscopy and atomic force microscopy. Finally, the long-time hydrogen charging was found to reduce the performance, as well as the thickness and oxide content of the passive films, mainly due to the capture of oxide atoms during strong oxidation of hydrogen atoms.
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