Abstract
Considerable grain growth occurred in a nanostructured Cu sample produced by surface mechanical attrition treatment during isothermal annealing at 423 K. The time-dependence of diffusion of (63)Ni in the nanostructured Cu was investigated by the radio-tracer technique. It was shown that the apparent interfacial diffusivity determined by taking into account the grain growth effects was higher by a factor of 10 than the value determined according to the model of stationary interfaces. (C) 2011 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
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