Effects of electron-beam irradiation on the properties of CN thin films deposited by direct dual ion beams

Abstract

We have investigated the effects of electron-beam irradiation on the formation of CN thin films and on the process of direct ion-beam deposition. The properties of CN thin films deposited with and without electron-beam irradiation are compared to verify the charge-enhanced bonding process. The total negative beam of negative-carbon ions and electrons can be induced from the Cs+ ion bombardment on a graphite target. Filtering of the electron beam from the total negative beam was obtained by the transverse magnetic field. The pure negative-carbon-ion beam or the total negative beam was deposited simultaneously with a positive-nitrogen-ion beam. The role of negative charge on the properties of CN thin films and the effects of charged state on the final bonding path of kinetic ion-beam deposition are discussed by comparing the films deposited with and without electron-beam irradiation. The properties of the films were evaluated from the nitrogen content, deconvolution results of N 1s spectra, and plasmon loss energy, which were characterized by x-ray photoelectron spectroscopy and electron energy-loss spectrometry.