Abstract
Transparent conductive GZO films were deposited on polycarbonate substrates by electron beam assisted radio frequency (RF) magnetron sputtering and then the influence of electron irradiation on the structural, optical and electrical properties of GZO films was investigated by using X-ray diffractometry, UV–vis spectrophotometry, four point probes, atomic force microscopy and UV photoelectron spectroscopy. Sputtering power was kept constant at 3W/cm2 during deposition, while electron irradiation energy varied from 450 to 900eV.Electron irradiated GZO films show larger grain sizes than those of films prepared without electron irradiation, and films irradiated at 900eV show higher optical transmittance in the visible wavelength region and lower sheet resistance (120Ω/□) than other films. The work-function is also increased with electron irradiation energy. The highest work-function of 4.4eV was observed in films that were electron irradiated at 900eV.
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