Abstract
Polycrystalline CrN/Si3N4 multilayer films were deposited by using two reactive magnetron sputtering targets, Crand Si, respectively, and the as-deposited multilayer coatings were annealed at900 °C for 2–4 h in vacuum. We investigated the effects of mixed discharge gaspressure, bias voltage, substrate temperature and annealing temperatureon the microstructural and interfacial properties of polycrystallineCrN/Si3N4 multilayer films. X-ray diffraction and x-ray reflectivity measurements showedthat the layer structure of the coatings is maintained even after annealing at900 °C for 4 hwhen the Si3N4 layer thickness is 0.3 nm, which meant that with proper control of theSi3N4 thickness CrN/Si3N4 multilayer coatings had an excellent thermal stability and were potential candidates forhigh-temperature tribological applications.
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