Abstract

We have investigated quantitatively the effect of crystal disorder on the formation of hydrogen molecule in crystalline silicon. Disordered crystalline silicon was obtained by implanting crystalline silicon with 200 keV Si + with doses ranging from 10 13 to 10 16 Si cm −2. The optical phonon line broadened and downshifted with increasing ion dose, corresponding to an increase in crystal disorder and decrease in phonon correlation length. The implanted samples were then treated with a remote downstream hydrogen plasma at 250°C. The vibrational Raman line of hydrogen molecule at around 4160 cm −1 decreased monotonically in its intensity with decreasing phonon correlation length. The results suggest that hydrogen molecules are formed preferably in well-ordered parts of Si lattice.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.