Abstract
The effect of residue chlorine on the synthesis of well-dispersed Pd nanoparticles on TiO2 supports using Pd atomic layer deposition (ALD) was investigated. The dispersion of Pd nanoparticles was compared over chlorine-containing and chlorine-free TiO2 supports prepared by selecting proper precursors. The detailed X-ray photoelectron spectroscopy and scanning transmission electron microscopy characterizations showed that higher dispersion of Pd nanoparticles was achieved on the chlorine-containing TiO2 surface than the chlorine-free TiO2. The preparation of TiO2 thin films and Pd nanoparticles was characterized by in situ FT-IR. The temperature required for complete deligation of palladium hexafluoroacetylacetonate decreased from 175 to 100 °C with the presence of chlorine on the TiO2 surface. Density functional theory calculations confirm that Pd–ligand bond strength could be weakened as Pd binds to the Cl sites. The water-gas-shift reaction was chosen as the model reaction, and the catalytic performance...
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