Abstract
In this study, the effects of carbon impurity in the atomic layer deposited-Al2O3 film on the hard X-ray photoelectron spectroscopy (HAXPES) spectra and the electrical properties of metal–insulator–semiconductor (MIS) structure were measured. The carbon concentration in the Al2O3 film was adjusted by varying the deposition conditions (precursor: trimethylaluminum, Al(CH3)3, or dimethylaluminum hydride, Al(CH3)2H, oxidant, and deposition temperature) in the atomic layer deposition process. The HAXPES measurements revealed the correlation between full width at half maximum (FWHM) of Al 1 s and O 1 s spectra and the carbon concentration in the Al2O3 film. Furthermore, the negative charges in the Al2O3 film could change the FWHM, attributed to the carbon impurity. The correlation between the carbon concentration and the electrical characteristics of the Al2O3/AlGaN/GaN MIS structure was analyzed. The interface state density and the effective charge density were dependent on the carbon concentration in the Al2O3 film.
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