Abstract
Thin films were deposited on SUS440 stainless steel samples by arc plasma evaporation at substrate bias voltages of 10–100 V. X-ray diffraction, optical microscopy, field emission scanning electron microscopy, energy dispersive spectroscopy, microhardness test, and electrochemical test were used to investigate the morphology and properties of the thin films. Particularly, the thin films were composed of chromium nitride (CrN, phases of CrN + Cr) and 0.76 mm thick. They were deposited with microdroplets on the samples. The surface hardness of these films reached the highest value of 1492 HV at the bias of 20 V. As the bias voltage increased, the adhesion of the CrN thin films decreased. The excessively high bias voltage of 100 V led to the delamination of the CrN thin films. The electrochemical test demonstrated that the corrosion resistance in the 3% NaCl solution of CrN coating can be improved.
Highlights
Chromium nitride (CrN) is a bright silver-grey-colored coating that has a high hardness [1] and a good resistance to oxidation and corrosion [2, 3]
Chang deposited CrN coatings by arc ion plating. He reported that the microhardness of the CrN coatings by arc ion plating method increased from 1550 HK50g to 2100 HK50g
The target current was maintained at 120 A to deposit CrN thin films on the SUS440 samples
Summary
Chromium nitride (CrN) is a bright silver-grey-colored coating that has a high hardness [1] and a good resistance to oxidation and corrosion [2, 3]. The properties of coatings by this method strongly depend on the technological parameters of deposition, such as bias voltage, nitrogen pressure, substrate temperature, and arc current. The effects of bias voltages in arc plasma evaporation on the adhesion and properties of CrN are still further investigated.
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