Abstract
TiN and (Ti, Al) N films were prepared by axisymmetric magnetic field (AMF) enhanced arc ion plating (AIP). The morphology, detailed size distribution, power law distribution and area ratio of Macro-particles (MPs) on the resultant TiN and (Ti, Al) N films were systematically investigated. Fewer and smaller MPs ejection was observed with an increase in the transverse component of AMF. MPs on (Ti, Al) N films was much more and larger than that on TiN films. The MPs distribution indicated a fractal characteristic, and the scattering behavior of MPs on films had more dependence on cathode material than magnetic field applied. The area ratio covered by the MPs on TiN films decreased from 15.4% to 2.9% when the TMF increased from 0 G to 30 G and that on (Ti, Al) N films decreased from 39.4% to 6.2% when the TMF increased from 0 G to 35 G.
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