Abstract
In this paper the results of substrate temperature effects on average grain size in FeNi 20:80 are shown. It was found that with an increase of the substrate temperature from 270 to 390 °C, the anisotropic magnetoresistive (AMR) effect increases from 1.2 to 2.3% and the coercive force from 1.6 to 5.3 Oe. The presence of two conflicting processes: the task of increasing AMR effect to achieve high sensitivity of AMR-sensor and to decrease the coercive force to increase the precision of conversion, leads to the necessity to find the optimum deposition temperature of the permalloy film. The dependence of the AMR effect and the coercive force on the substrate temperature during deposition was obtained. This dependence shows that the substrate temperature increasing above 320 °C leads to coercive force increasing and does not lead to a substantial AMR increasing. In this regard, the substrate temperature 320 °C was determined as optimal.
Highlights
The ability of the magnetic thin films to change its resistance under the influence of an external magnetic field is applied in the creation of effective magnetic field measurement devices [1, 2, 3, 4, 5]
anisotropic magnetoresistive (AMR) effect is expressed by the formula: ρ(θ) =ρ0 + Δρcos2θ where θ - the angle between the magnetization vector and the electrical current direction, Δρ/ρ0 – the magnetoresistivity coefficient
To ensure a high level of output characteristics of AMR sensors it is needed to improve the magnetic properties of the magnetoresistive material
Summary
The ability of the magnetic thin films to change its resistance under the influence of an external magnetic field is applied in the creation of effective magnetic field measurement devices [1, 2, 3, 4, 5]. FeNi widely used to create anisotropic magnetoresistive sensors (AMR sensors), which convert magnetic field into an electrical signal due to a change in conductivity with a change of the angle between the current vector and the magnetization vector in the permalloy film. To create the anisotropy and the AMR in the magnetron deposition camera magnetic field was generated at least 40 Oe. In this article an experiment was conducted to determine the impact of process parameters on the deposition rate of the material and the grain size in films of FeNi 20:80 during magnetron deposition. To establish the relationship between the characteristics of the films of permalloy and output parameters AMR sensors, primarily sensitivity a complex of studies showing a significant influence of the substrate temperature on the average grain size in the film of permalloy The average grain size measurement was conducted on the multifunctional xray analytical systems "RIKOR-8", "X-Ray MiniLab-6"
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