Abstract
MgO films were prepared by ion-beam-assisted sputtering deposition from a metal magnesium target. Effects of assisting ion energy Ea and current density Ja on the orientation and surface morphology of the films were analysed in detail. The results show that moderate Ea and Ja could enhance the crystallinity, but high Ea and Ja can destroy the crystallinity of the films. Assisting ion energy Ea is an important factor for orientation selection, and the formation of (100) orientation needs high Ea and low Ja.
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