Abstract
Post-annealing treatment in nitrogen gas flow has been carried out for P-doped Zn1−xMgxTe layer grown under a Te-rich or Te-poor condition by metalorganic vapor phase epitaxy. The electrical and photoluminescence properties of P-doped Zn1−xMgxTe layers are altered by annealing treatment. The post-annealing is very effective in obtaining p-type conductive Zn1−xMgxTe for the layer grown under a Te-poor condition. On the other hand, Zn1−xMgxTe layer is characterized by a high compensation ratio and DAP luminescence for the layer grown under a Te-rich condition, even after annealing treatment. Similar tendencies are also found in P-doped ZnTe layers.
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