Effects of ALD Deposition Cycles of Al2O3 on the Morphology and Performance of FTO-Based Dye-Sensitized Solar Cells

Abstract

In dye-sensitized solar cells (DSSCs), materials classified as Transparent Conducting Oxides (TCOs) have the capacity to conduct electricity and transmit light at the same time. Their exceptional blend of optical transparency and electrical conductivity makes them popular choices for transparent electrodes in DSSCs. Fluorine Tin Oxide (FTO) was utilized in this experiment. The optical and electrical characteristics of TCOs may be negatively impacted by their frequent exposure to hostile environments and potential for deterioration. TCOs are coated with passivating layers to increase their performance, stability, and defense against environmental elements including oxygen, moisture, and chemical pollutants. Because of its superior dielectric qualities, strong chemical stability, and suitability with TCO materials, aluminum oxide (Al2O3) was utilized as a passivating layer for the FTO. In this research work, Al2O3 was deposited via atomic layer deposition (ALD) to form thin mesoporous layers as a passivator in the photoanode (working electrode). The work focuses on finding an appropriate thickness of Al2O3 for optimum performance of the dye-sensitized solar cells. The solar simulation and sheet resistance analysis clearly showed 200 cycles of Al2O3 to exhibit an efficiency of 4.31%, which was the most efficient performance. The surface morphology and topography of all samples were discussed and analyzed.