Abstract
This paper reports on the doping effects of aluminum (Al) into Titanium dioxide (TiO2) which were deposited by sol-gel spin coating technique onto glass substrate using different doping concentration namely 0wt.%, 1wt.%Al, 3wt.%Al and 6 wt.%Al. The annealing temperature was 500°C for a period of 1 hour. The research is focusing on the optimum Al-TiO2 thin film properties. The structural properties, surface morphological, surface topological, electrical and optical properties were studied. For 3wt.%Al, transparent Al-TiO2 thin film were the optimum deposited than the others. Electrical measurements were performed to investigate the improvement of the Al-TiO2 resistivity. The effects of Al doping on surface morphologies, surface topologies and roughness, structural properties, and optical properties were investigated using techniques such as a field emission scanning electron microscope (FESEM), an atomic force microscope (AFM), an X-ray diffractometer (XRD), and an ultraviolet-visible spectrometer (UV-Vis)...
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