Abstract
The serious quality problem in the magnetic substrate during polishing process by using conventional lapping machine had generate the idea to develop a doubled-sided lapping machine of polishing stone manufactured of an abrasive and resin. After certain parameter of polishing process, the polishing stone starts to clog because of debris agglomeration from the polishing substrate, thus lead to the scratches on the magnetic substrate which will affect its performance. Three difference type of acid were used as to dissolve the debris agglomeration in the polishing stone. The influence of oxalic, phosphoric and citric acid at three different times were examined. It was found that oxalic acid is the best chelating agent in dissolving the debris in the polishing stone.
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