Abstract
We investigated the printability of various OPC patterns with different sizes and densities for mask technology below 0.13 micrometers design rule using CAR and 50kV e-beam system. Because of high resolution characteristics of CAR process with high acceleration voltage system, we obtained OPC printability of 0.12 micrometers even in scattering bar type and excellent pattern fidelity. How to design to get required OPC pattern, design guide was considered in this work and discussed the applicability of CAR process to practical manufacturing of OPC masks of 0.13 micrometers design rule or less.
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