Abstract
ABSTRACTThe effect of incorporating a Yb diffusion barrier on the electrical and interfacial properties of In/Hg1−xCdxTe contacts has been examined. Measurements of the specific contact resistance, pc, as a function of Yb layer thickness were performed for a series of semiconductor compositions from x = 0.32 to 0.65. Large changes in pc were evident only at x 0.56 and above a Yb thickness of 2.5nm to 6.0nm, this critical level of layer thickness decreasing with x-value. Analytical examination of the interfaces by Auger electron spectroscopy, secondary ion mass spectroscopy and Rutherford backscattering spectrometry has shown a progressive reduction in the extent of In indiffusion with increasing thickness of the Yb interlayer.
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