Abstract
Achieving dense off-chip interconnection with satisfactory electrical performance is emerging as a major challenge in advanced system engineering. Graphene nanoribbons (GNRs) have been recently proposed as one of the potential candidate materials for both transistors and interconnect. In addition, development is still underway for alternative materials and processes for high aspect ratio (AR) contacts. Studding the effect of varying aspect ratio on relative stability of graphene nanoribbon interconnects is an important viewpoint in performance evaluation of system. In this paper, Nyquist stability analysis based on transmission line modeling (TLM) for GNR interconnects is investigated. In this analysis, the dependence of the degree of relative stability for multilayer GNR (MLGNR) interconnects on the aspect ratio has been acquired. It is shown that, with increasing the aspect ratio of each ribbon, MLGNR interconnects become more unstable.
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